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How to measure the local Dzyaloshinskii-Moriya Interaction in Skyrmion Thin-Film Multilayers

机译:如何测量Skyrmion薄膜多层中的局部Dzyaloshinskii-Moriya相互作用

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摘要

The current-driven motion of skyrmions in MnSi and FeGe thinned single crystals could be initiated at current densities of the order of 106 A/m2, five orders of magnitude smaller than for magnetic domain walls. The technologically crucial step of replicating these results in thin films has not been successful to-date, but the reasons are not clear. Elucidating them requires analyzing system characteristics at scales of few nm where the key Dzyaloshinskii-Moriya (DM) interactions vary, and doing so in near-application conditions, i.e. in systems at room temperature, capped with additional layers for oxidation protection. In this work’s magnetic force microscopy (MFM) studies of magnetron-sputtered Ir/Co/Pt-multilayers we show skyrmions that are smaller than previously observed, are not circularly symmetric, and are pinned to 50-nm wide areas where the DM interaction is higher than average. This finding matches our measurement of inhomogeneity of the magnetic moment areal density, which amounts to a standard deviation of the Co layer thickness of 0.3 monolayers in our 0.6 nm thick Co layers. This likely originates in small Co layer thickness variation and alloying. These film characteristics must be controlled with greater precision to preclude skyrmion pinning.
机译:MnSi和FeGe稀化单晶中的Skyrmion的电流驱动运动可以在10 6 A / m 2 的电流密度下启动,小五倍比磁畴壁迄今为止,在薄膜中复制这些结果的技术上至关重要的步骤尚未成功,但原因尚不清楚。要阐明它们,需要在几个纳米尺度上分析系统特征,其中关键的Dzyaloshinskii-Moriya(DM)相互作用会发生变化,并且在接近应用的条件下(即在室温下的系统中进行此操作,并在其上盖上额外的层以进行氧化保护)。在这项对磁控溅射的Ir / Co / Pt多层薄膜的磁力显微镜(MFM)研究中,我们显示了比以前观察到的要小的Skyrmion,它们不是圆对称的,并且被固定在DM相互作用为50 nm的宽区域高于平均水平。这一发现与我们对磁矩面密度的不均匀性的测量结果相符,这相当于我们在0.6?nm厚的Co层中0.3个单层的Co层厚度的标准偏差。这可能是由于Co层厚度变化小和合金化引起的。必须以更高的精度控制这些薄膜特性,以防止天花胶钉扎。

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