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Effect of Ge Nanocrystals on 1.54 μm Photoluminescence Enhancement in Er2O3:ZnO and Ge Co-Sputtered Films

机译:Ge纳米晶体对Er2O3:ZnO和Ge共溅射膜中1.54μm光致发光增强的影响

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摘要

Photoluminescence (PL) of Er and Ge co-doped ZnO films synthesized by radio frequency magnetron co-sputtering was investigated. X-ray diffraction (XRD) patterns showed that the annealing process at 400–800 °C led to the formation of nanocrystal (nc) Ge. Samples containing nc-Ge showed a strong visible PL with a peak at 582–593 nm, which was consistent with the calculated energy of the exciton of the ~5 nm-sized nc-Ge, according to the quantum confinement effect. The formation of nc-Ge could greatly enhance the 1.54 μm emission, and it is considered that the 1.54 μm PL enhancement may come from a joint effect of both the energy transfer from nc-Ge to Er3+ and the local environment change of Er3+.
机译:研究了通过射频磁控共溅射合成的Er和Ge共掺杂ZnO薄膜的光致发光(PL)。 X射线衍射(XRD)图表明,在400–800°C的退火过程导致形成了纳米晶体(nc)Ge。根据量子约束效应,含有nc-Ge的样品显示出很强的可见光PL,其峰在582–593 nm处,与〜5 nm大小的nc-Ge的激子计算出的能量一致。 nc-Ge的形成可以极大地增强1.54μm的发射,并且认为1.54μmPL的增强可能来自于nc-Ge到Er 3 + 的能量转移的共同作用。 Er 3 + 的局部环境变化。

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