多层金刚石薄膜的制备研究

摘要

Monolayer microcrystalline diamond,nanocrystalline diamond and three-layer(the structure of films is mi-cron layer(MCD)anolayers(NCD)/micron layer(MCD))diamond films were deposited on Si substrate with H2/CH4/CO2 gas mixtures as source using microwave plasma chemical vapor deposition method respectively. The quality,surface morphology and grain size of diamond films were systematically characterized by Raman spectroscopy,scanning electron microscopy(SEM)and X-ray diffraction(XRD). The results show that microcrystalline diamond with coarse grains and rough surface,nanocrystalline diamond with fine grain size and surface roughness,multilayer diamond films can be pre-pared by control of the reaction parameters in the growth process,can significantly reduce the surface roughness by the introduction of three-layer structure.%利用微波等离子体化学气相沉积法，以H2/CH4/CO2为混合气源，在Si基底上分别沉积了单层微米、纳米以及三层（膜层结构为微米层（MCD）/纳米层（NCD）/微米层（MCD））金刚石薄膜。利用Raman光谱、扫描电子显微镜（SEM）和X射线衍射（XRD）表征金刚石膜，以得到样品质量、表面形貌、晶粒尺寸等信息。结果表明：微米金刚石晶薄膜粒粗大，表面粗糙，纳米金刚石薄膜晶粒细小，表面平整，生长过程中控制反应参数，可以制备出多层金刚石膜，三层结构的引入，可以明显降低表面粗糙度。