以高岭石/二甲基亚砜(K/DMSO)为前驱体,用熔融法制备了高岭石/对甲基苯磺酸(K/p-TSA)插层复合物,并用XRD、FI-IR、TG-DSC对插层复合物进行了表征.结果表明:反应12h时,K/p-TSA插层复合物出现1.014nm、1.088nm、1.263nm、1.378nm四个衍射峰,插层率为89.7%,p-TSA分子在高岭石层间主要采取单层倾斜相和双层平卧相,并且K/p-TSA插层复合物在112℃以下较稳定.%The kaolinite/p-toluene sulfonic acid (K/p-TSA) intercalation compound was prepared by the melting method with the kaolinite/dimethyl sulphoxide (K/DMSO) as intercalation precursor. The intercalation compound was characterized by the X-ray diffraction (XRD), Fourier transform infrared spectrometer (FT-IR), Simultaneous TG-DSC Apparatus. The results showed that the spacings of layers of the K/p-TSA intercalation compound reacted for 12h were about 1.014nm, 1.088nm, 1.263nm, 1.378nm, the intercalation ratio reached 89.7% approximately, and the p-TSA molecules mainly adopted single-tilt phase and double-lying phase between kaolin layers, and the K/p-TSA intercalation compound was stable under 112℃.
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