300mm硅片高精度真空传输系统设计

摘要

This paper designs a 300 mm silicon wafer handling system, to meeting requirements of the market for silicon wafer transmission process with high precision, high cleanliness and high efficiency. In this paper, silicon wafer transfer chamber was designed with vacuum. The structure of the vacuum chamber was optimized to adapt to 300 mm silicon wafer transmission. Its vacuum degree can be up to 2×10-7Torr.The vacuum manipulator used symmetric connecting rod and direct drive, and the atmospheric manipulator used R-θ type manipulator, The repeat accuracy of manipulators is ±0.1 mm. AWC deviation detection system is designed. The photoelectric correlation sensors are used to achieve real-time detection and correct position of silicon wafer. Through analyzing confirmatory test data, we got the precision,cleanliness,vacuum and value of vacuum changed for the whole system of silicon wafer automatic transmission. It can meet requirements of silicon wafer transmission. The tests verify the rationality of the design.%文章设计一种300mm硅片真空传输系统,满足市场对硅片传输过程高精度,高洁净度,高效率的需求.其中硅片传输腔室采用真空设计,并优化了真空腔室的结构以适应300mm硅片传输,真空度可达2×10-7Torr.真空机械手采用对称连杆直驱机械手,大气机械手采用R-θ型机械手,其重复精度均为±0.1mm.设计了AWC纠偏检测系统,利用光电对射传感器,实现对硅片的实时检测及位置纠正.通过验证性试验数据分析,得到整个系统的整体精度、洁净度、真空度和真空变化值满足工作要求,验证了设计的合理性.