首页> 中文期刊> 《材料导报》 >金属有机沉积法制备La2CuMnO6缓冲层薄膜及其结构表征

金属有机沉积法制备La2CuMnO6缓冲层薄膜及其结构表征

         

摘要

Thermogravimetric analysis (TG) was used to research the chemical solution method precursor body mixture thermal decomposition process, and then the precalcining temperature was determined; by using X-ray diffraction (XRD) and atomic force microscope (AFM), the metal organic deposition (MOD) prepared La2CuMnO6 phase composition and morphology of the film structure were characterized. The results show that choosing suitable precursor La(CH3COO)3·1. 5H2O, Cu-(CH3COO)2 ·1.0 H2O, Mn(CH3COO)2·4. 0H2O at 1000℃, thermal 3h, Sr-TiOs(STO) (100) substrate, Ar-4% H2 atmosphere and total ion concentration 1.0mol/L, under this conditions prepared La2CuMnO6 film has good c-axis texture, the film surface is smooth, even, no cracks, no holes, evenly distributed and arranged in compact, fully meet the requirements of the buffer layer on the film.%利用热重分析(TG)对化学溶液法前驱体混合物的热分解过程进行研究,确定了预分解温度;利用X射线衍射(XRD)和原子力显微镜(AFM)对金属有机沉积法(MOD)合成的La2CuMnO6薄膜的相组成和形貌结构进行了表征.结果表明,选择合适的前驱体La(CH3COO)3·1.5H2O、Cu(CH3COO)2·1.0H2O、Mn(CH3COO)2·4.0H2O,在1000℃、保温时间3h、SrTiO3(STO)(100)、Ar-4% H2气氛及总离子浓度1.0mol/L的工艺条件下制备的La2CuMnO6薄膜具有很好的c轴织构,薄膜表面较平整、均匀、无裂纹、无孔洞,分布均匀且排列致密,完全满足缓冲层对薄膜的要求.

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