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机译:通过激光化学气相沉积法在具有LaMnO_3 / MgO / Gd_2Zr_2O_7缓冲层的Hastelloy C276金属基底上制备双层YBa_2Cu_3O_(7-x)/ CeO_2薄膜
Wuhan Inst Technol, Hubei Key Lab Plasma Chem & Adv Mat, Key Lab Green Chem Proc, Minist Educ,Sch Mat Sci & Engn,Sch Sci, Wuhan 430074, Hubei, Peoples R China;
Wuhan Inst Technol, Hubei Key Lab Plasma Chem & Adv Mat, Key Lab Green Chem Proc, Minist Educ,Sch Mat Sci & Engn,Sch Sci, Wuhan 430074, Hubei, Peoples R China;
Wuhan Inst Technol, Hubei Key Lab Plasma Chem & Adv Mat, Key Lab Green Chem Proc, Minist Educ,Sch Mat Sci & Engn,Sch Sci, Wuhan 430074, Hubei, Peoples R China;
Wuhan Inst Technol, Hubei Key Lab Plasma Chem & Adv Mat, Key Lab Green Chem Proc, Minist Educ,Sch Mat Sci & Engn,Sch Sci, Wuhan 430074, Hubei, Peoples R China;
Wuhan Inst Technol, Hubei Key Lab Plasma Chem & Adv Mat, Key Lab Green Chem Proc, Minist Educ,Sch Mat Sci & Engn,Sch Sci, Wuhan 430074, Hubei, Peoples R China;
Tohoku Univ, Inst Mat Res, 2-1-1 Katahira, Sendai, Miyagi 9808577, Japan;
Laser chemical vapor deposition; CeO2 buffer layer film; YBCO film; Hastelloy C276 metal substrate; Double-layer film;
机译:激光功率对通过激光化学气相沉积法沉积在Hastelloy C276胶带上的CeO_2薄膜的取向和微观结构的影响
机译:喷雾雾化共沉淀激光化学气相沉积法在Hastelloy C276衬底上制备YBa2Cu3O7-δ超导膜的沉积速率影响研究
机译:使用液体源前驱体通过激光化学气相沉积法在CeO_2缓冲膜上沉积的YBa_2Cu_3O_(7-δ)的取向控制和电性能
机译:使用CEO_2 / YSZ缓冲层组合的基板上的YBA_2CU_3O_(7-X)薄膜外延生长
机译:金属有机化学气相沉积法合成钇钡(2)铜(3)氧(7-x)超导薄膜。
机译:通过原子层沉积和化学气相沉积在高纵横比结构中沉积的薄膜的ToF-SIMS 3D分析
机译:使用固体前驱体通过激光化学气相沉积在(100)MgO单晶衬底上制备(100)取向CeO2膜