衬底温度对Zn095Ca005O薄膜结构和光学性质的影响

摘要

利用磁控溅射法在玻璃基片上制备Zn095Ca005O薄膜，用X射线衍射（XRD）研究薄膜的结构特性，用LS920荧光光谱仪测量了样品薄膜的PL谱，探讨了衬底温度对薄膜结晶质量和光学性质的影响。研究发现，衬底温度对薄膜的质量影响较小，450℃时制备的薄膜结晶质量最好；不同衬底温度对发光峰强度有影响；薄膜在可见光区显示出较高的透过性，在350－400nm范围内薄膜透过率骤然下降，在该范围内存在吸收边。%Magnetron sputtering is used to prepare Zn095Ca005O thin films on glass substrates. XRD is used to research the structural character of the thin film. LS920 fluorescence spectrometer is used to research the PL spectrum of the sample film. The influence that substrate temperature exert to quality of the crystallization and optical properties of thin films is discucsed. It is found that the suhstrate temperature on the film influent little quality, 450℃ prepared film has the best crystallization quality. The peak of flims at different temperature has a strong influence on the intensity of peak. thin films has high transmissivity, in the 350-400 nm range film transmittance decreases, absorption edge exists in this extent.