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Effects of substrate temperature on structural, electrical and optical properties of As-doped ZnO films

机译:衬底温度对掺As的ZnO薄膜结构,电学和光学性质的影响

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As-doped ZnO films were prepared by co-sputtering ZnO and Zn_3As_2 targets on glass substrates at various temperatures from 250 to 500 ℃. The effects of substrate temperature on structural, electrical and optical properties of the films were investigated. The films grown at temperatures from 250 to 400 ℃ were c-axis oriented and those deposited above 400 ℃ exhibited poor crystallinity. Hall measurement showed that p-type ZnO: As films were prepared at different temperatures. With increasing the substrate temperature from 250 to 500 ℃, the optical band gap (E_g) first decreased, and then increased. The E_g changes upon the substrate temperature were due to the effect of substrate temperature on the crystallinity of ZnO films.
机译:在250至500℃的不同温度下,通过在玻璃基板上共溅射ZnO和Zn_3As_2靶,制备了掺杂ZnO薄膜。研究了基材温度对薄膜结构,电学和光学性质的影响。在250到400℃的温度下生长的薄膜是c轴取向的,而在400℃以上沉积的薄膜则具有差的结晶度。霍尔测量表明,在不同温度下制备了p型ZnO:As薄膜。随着基板温度从250℃升高到500℃,光学带隙(E_g)首先减小,然后增大。衬底温度上的E_g变化是由于衬底温度对ZnO膜的结晶度的影响。

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