用于平面靶X射线诊断的1维KBA显微镜

摘要

对用于神光Ⅱ装置4.75keV能点平面靶成像诊断的1维KBA显微镜进行了实验研究.基于空间分辨力和工作环境要求,设计了1维KBA显微镜的光学结构,并与传统KB显微镜的成像性能进行了对比分析.设计和制备了可同时工作于8keV和4.75keV能点的双能点多层膜KBA物镜,解决了系统装调问题.利用神光Ⅱ装置第九路激光打击Ti靶产生的X射线作为背光源照射1500目金网,进行了4.75keV网格成像实验,结果表明:在整个背光源照明区域内,系统的实际分辨力约为4μm,系统的有效视场受背光源大小的限制.%A one-dimensional KBA microscope (or diagnosis of planar targets, working at 4. 75 keV, has been experimentally studied. According to the requirements of spatial resolution and working environments, the optical structure of one-dimensional KBA microscope was designed, and compared with conventional Kirkpatrick-Baez microscope. A double-periodic multilayer KBA mirror simultaneously working at 8 keV and 4. 75 keV was adopted and manufactured to complete the system alignment. The 4. 75 keV X-ray imaging experiment in XRL chamber of Shenguang Ⅱ shows that the resolution is about 4 μm in all the illumination area of backlighter, and the effective field of the one-dimensional KBA microscope is limited by hacklighter size.