首页> 中文期刊> 《电镀与涂饰》 >高功率脉冲磁控溅射沉积(AlCrNbSiTiV)N薄膜提升刀具的切削性能

高功率脉冲磁控溅射沉积(AlCrNbSiTiV)N薄膜提升刀具的切削性能

         

摘要

通过高功率脉冲反应磁控溅(HIPIMS)在车刀表面溅镀(AlCrNbSiTiV)N高熵合金氮化物薄膜.研究了溅镀功率(120、150、180、210和240 W)对薄膜的形貌、厚度、沉积速率、硬度、弹性恢复率等性质的影响.以50CrMo4铬钼合金钢作为被切削材料,在干式切削条件下考察了切削后工件的表面粗糙度和车刀的腹部磨耗.结果表明,增大溅镀功率可以提高薄膜的硬度和耐磨性,被切削工件的表面质量得到明显的改善,刀具磨损量大大减小.%An AlCrNbSiTiV high-entropy alloy nitride film was sputtered on turning tool by high-power impulse reactive magnetron sputtering (HIPIMS). The effect of sputtering power (120, 150, 180, 210, and 240 W) on the properties such as morphology, thickness, deposition rate, hardness, and elastic recovery of the film was studied. The surface roughness of the 50CrMo4 steel workpiece cut by the sputtered turning tool under dry condition and its flank wear were examined. The results showed that the increase of sputtering power greatly increased the hardness and wear resistance of the film, improved the surface quality of the cut workpiece, and reduced the tool wear.

著录项

相似文献

  • 中文文献
  • 外文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号