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Ridge waveguide mid-infrared indium gallium arsenic antimonide quantum well lasers fabricated with pulsed anodization etching.

机译:脊形波导中红外铟镓砷锑锑量子阱激光器,采用脉冲阳极氧化刻蚀制成。

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摘要

Mid-infrared quantum well lasers based on the InGaAsSb/AlGaAsSb material system are designed and demonstrated. Various aspects of the strained quantum well laser diode in this material system were extensively studied: the development of an etching technique, the design of a thin p-clad ridge waveguide structure, and the characterization of ridge waveguide lasers fabricated with the newly developed etching technique. Theoretical modeling also confirmed experimental results.; Deep etching of p-cap GaSb/p-clad AlGaAsSb layers was demonstrated using a single step, pulsed anodization/etching for the first time. A new electrolyte composed of glycol, water, and two acids was used. An important feature of this technique is the realtime, electrical detection of layer interfaces in the diode laser structure.; Ridge waveguide lasers fabricated with this PAE technique have demonstrated very low threshold currents at room temperature in both pulsed and continuous-wave operation with emission wavelengths of 1.8--1.9 Am. These experimental results imply that the pulsed anodization/etching with the new electrolyte system is a viable process for fabricating high quality ridge waveguide InGaAsSb quantum well diode lasers.; In order to possibly raise the continuous-wave operating temperature and output power capability, an asymmetric waveguide structure was designed in the InGaAsSb quantum well laser by decreasing the thickness of the p-clad layer. This design requires a shallow etching step in fabricating ridge waveguide lasers and could lead to a scheme for fabricating distributed feedback lasers without need of an epitaxial regrowth process. The pulsed anodization/etching technique was used to fabricate the first thin p-clad InGaAsSb quantum well lasers that operated continuous-wave at room temperature at an emission wavelength of 2.2 Am.; Theoretical modeling was conducted to compare with experimental data. The emission wavelengths were in good agreement with theoretical calculations that involve strain effects on the band lineups and several interpolation schemes for material parameters of InGaAsSb and AlGaAsSb quaternaries.
机译:设计并论证了基于InGaAsSb / AlGaAsSb材料系统的中红外量子阱激光器。对该材料系统中的应变量子阱激光二极管的各个方面进行了广泛的研究:蚀刻技术的发展,薄p包层脊形波导结构的设计以及使用新开发的蚀刻技术制造的脊形波导激光器的特性。理论建模也证实了实验结果。首次使用脉冲阳极氧化/蚀刻这一步骤演示了对p-cap GaSb / p-包覆AlGaAsSb层的深度蚀刻。使用了一种由乙二醇,水和两种酸组成的新电解质。该技术的重要特征是二极管激光器结构中层接口的实时电检测。使用此PAE技术制造的脊形波导激光器在脉冲和连续波操作中均显示出室温下的阈值电流非常低,发射波长为1.8--1.9 Am。这些实验结果表明,用新的电解质系统进行脉冲阳极氧化/蚀刻是制造高质量脊形波导InGaAsSb量子阱二极管激光器的可行方法。为了提高连续波工作温度和输出功率的能力,通过减小p包层的厚度,在InGaAsSb量子阱激光器中设计了一种非对称波导结构。这种设计需要在制造脊形波导激光器中进行较浅的蚀刻步骤,并且可能导致无需外延再生过程即可制造分布式反馈激光器的方案。脉冲阳极氧化/蚀刻技术被用于制造第一薄的p包层的InGaAsSb量子阱激光器,该激光器在室温下以2.2 Am的发射波长在室温下连续波工作。进行了理论建模以与实验数据进行比较。发射波长与理论计算非常吻合,理论计算涉及应变对能带排列的影响以及InGaAsSb和AlGaAsSb四元材料参数的几种内插方案。

著录项

  • 作者

    Yoon, John.;

  • 作者单位

    University of Florida.;

  • 授予单位 University of Florida.;
  • 学科 Physics Optics.; Engineering Electronics and Electrical.; Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 2000
  • 页码 117 p.
  • 总页数 117
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 光学;无线电电子学、电信技术;工程材料学;
  • 关键词

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