首页> 外国专利> NEW STRUCTURE AND METHOD FOR FABRICATING INDIUM PHOSPHIDE/INDIUM GALLIUM ARSENIDE PHOSPHIDE BURIED HETEROSTRUCTURE SEMICONDUCTOR LASERS

NEW STRUCTURE AND METHOD FOR FABRICATING INDIUM PHOSPHIDE/INDIUM GALLIUM ARSENIDE PHOSPHIDE BURIED HETEROSTRUCTURE SEMICONDUCTOR LASERS

机译:制造磷化铟/砷化镓铟磷化氢埋入异质结构半导体激光器的新结构和新方法

摘要

It is the different crystal structure using InGaAsP InGaAsP active layers that semiconductor laser modulation bandwidth with higher, which does cap layers,. Channel is anisotropically etched across cap, covering and active layer and partially by buffer layer. Activity and cap layers lateral etches and semi insulating material layer cover side wall. Further etch the material active layer of the semi-insulating surrounding of the thin-walled left. 1.3 &mgr; 3 dB bandwidth intrinsic resonance frequency of m and InGaAsP lasers is more than that 24 GHz and 22 GHz have been successfully fabricated. The semiconductor laser that the highest bandwidth was once reported, with resonant frequency InGaAsP lasers when ceiling capacity. Excellent modulation efficiency is observed high frequency.
机译:使用InGaAsP InGaAsP有源层的不同晶体结构具有更高的半导体激光调制带宽,可以覆盖层。跨盖,覆盖层和有源层以及部分被缓冲层各向异性蚀刻沟道。活性层和盖层横向蚀刻,半绝缘材料层覆盖侧壁。进一步蚀刻薄壁左侧的半绝缘周围的材料活性层。 1.3&mgr; m和InGaAsP激光器的3 dB带宽本征谐振频率大于成功制造的24 GHz和22 GHz。曾经报道过最高带宽的半导体激光器,具有谐振频率的InGaAsP激光器在达到上限容量时。高频观察到优异的调制效率。

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