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Semiconductor optical device e.g. laser comprises substrate which has an indium phosphide base and an active layer containing specified concentrations of gallium, indium, arsenic and nitrogen
Semiconductor optical device e.g. laser comprises substrate which has an indium phosphide base and an active layer containing specified concentrations of gallium, indium, arsenic and nitrogen
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机译:半导体光学器件激光器包括具有磷化铟基底和包含特定浓度的镓,铟,砷和氮的活性层的衬底
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摘要
A semiconductor optical device (100) comprises: (a) a substrate (1) with a base of indium phosphide; (b) an active layer (32) having a composition adjusted for an operating wavelength greater than 1.5 mu m which contains a concentration x of gallium, a concentration 1-x of indium and a concentration y of arsenic, where x is greater than or equal to 0.48; (c) the composition also includes a concentration z of nitrogen of less than or equal to 0.05 and the concentration y is essentially equal to 1-z.
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