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Fabrication and characterization of germanium doped silica ridge waveguides using a novel colloidal suspension approach.

机译:使用新颖的胶体悬浮方法制造和表征掺锗的硅脊形波导。

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摘要

A novel colloidal suspension process and associated fundamental principles were investigated to produce optical-quality, pure and germanium-doped silica films for integration of planar lightwave circuits (PLC) with silicon optical bench (SiOB) technology. Studies of the rheology of the colloidal suspensions of nanosized fumed silica and the characteristics of the resultant films (e.g. critical thickness) allowed the selection of an optimal colloidal suspension for thick silica films. Crackfree, silica films up to 1.4 mum in thickness per layer could be obtained after consolidation in 1 atm of He-O 2 mixture at 1300°C. Multiple spin coating followed by the consolidation treatment yielded fully dense silica films of thicknesses in the order of 10 mum, sufficient to meet the dimensional requirement for planar optical waveguides.; For pure silica films, their refractive index was 1.4577 +/- 0.0005 at a wavelength of 632.8 nm. This value is comparable to that of thermally grown oxide on silicon substrate, a confirmation of the density of the silica films. Germanium doping of silica to various concentrations was achieved using colloidal silica suspensions mixed with tetramethylammonium germanate aqueous solutions. Indices of refraction of germanium-doped silica films increased linearly with dopant concentration, thus enabling index tuning (maximum refractive index contrast, Deltan = 0.015) while maintaining the amorphous nature as well as the desired optical properties of the films.; Prototype ridge waveguides were fabricated using 3.1 mol % germanium-doped silica layers on 15 mum thick thermally oxidized silicon substrates by conventional photolithography and reactive ion etching. The propagation loss in the waveguides (6.5 mum high, 10 mum wide in the cross-section dimension) was 3.3 +/- 0.5 dB/cm as measured by the cutback method. Further reduction in propagation loss is possible with improved sidewall smoothness of the waveguides and application of overcladding layer.; This research represents the first known attempt to use the colloidal suspension approach for the fabrication of ridge waveguides on silicon substrates. The knowledge established in the chemistry of colloidal suspensions as well as the correlation between processing and properties of the spin coated pure and doped silica films will prove valuable in further developing and implementing a commercially viable sol-gel method for PLC with SiOB technology.
机译:研究了一种新颖的胶体悬浮工艺和相关的基本原理,以生产光学质量的纯锗掺杂的二氧化硅膜,从而将平面光波电路(PLC)与硅光具座(SiOB)技术集成在一起。对纳米级气相法二氧化硅胶体悬浮液的流变学和所得膜的特性(例如临界厚度)的研究允许选择用于厚二氧化硅膜的最佳胶体悬浮液。在1300°C下在1 atm的He-O 2混合物中固结后,可以获得每层厚度达1.4 mm的无裂纹二氧化硅膜。多次旋涂并随后进行固结处理,产生了完全致密的二氧化硅膜,其厚度约为10微米,足以满足平面光波导的尺寸要求。对于纯二氧化硅膜,它们在632.8 nm的波长下的折射率为1.4577 +/- 0.0005。该值可与在硅衬底上热生长的氧化物的值相比较,证实了二氧化硅膜的密度。使用胶体二氧化硅悬浮液与锗酸四甲铵水溶液混合可实现各种浓度的锗锗掺杂。掺锗的二氧化硅膜的折射率随掺杂剂浓度线性增加,因此能够进行折射率调整(最大折射率对比,Deltan = 0.015),同时保持膜的非晶性和所需的光学性能。原型脊形波导是通过常规光刻和反应离子刻蚀在15微米厚的热氧化硅基板上使用3.1 mol%的锗掺杂二氧化硅层制成的。通过削减方法测得的波导中的传播损耗(高6.5μm,横截面尺寸宽10μm)为3.3 +/- 0.5dB / cm。随着波导侧壁光滑度的改善和外覆层的应用,传播损耗的进一步降低是可能的。这项研究代表了首次使用胶体悬浮法在硅衬底上制造脊形波导的尝试。在胶体悬浮液的化学过程中建立的知识以及旋涂的纯净掺杂的二氧化硅薄膜和掺杂的二氧化硅薄膜的加工与性能之间的相关性将被证明对于进一步开发和实施具有SiOB技术的PLC的商业化溶胶-凝胶方法非常有价值。

著录项

  • 作者

    Kim, Deok-Yang.;

  • 作者单位

    Stevens Institute of Technology.;

  • 授予单位 Stevens Institute of Technology.;
  • 学科 Engineering Materials Science.; Physics Optics.
  • 学位 Ph.D.
  • 年度 2004
  • 页码 156 p.
  • 总页数 156
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;光学;
  • 关键词

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