PROCESS FOR THE GERMANIUM-DOPING OF OPTICAL WAVEGUIDE BASE MATERIAL BASED ON VITREOUS SILICA

摘要

PROCESS FOR THE GERMANIUM-DOPING OF OPTICAL WAVEGUIDEBASE MATERIAL BASED ON VITREOUS SILICAABSTRACT OF THE DISCLOSUREA process is provided which permits the effectivemanufacture of optical waveguide base material that has beendoped with germanium and is based on vitreous silica. Accordingto the invention, silicon chlorides of the formula SinCl2n+2,in which "n" is an integer from 2 to 6 especially hexachlorodi-silane, are used as glass-formers in the presence of oxygen andgermanium tetrachloride at temperatures of from 1100 - 1600°C.