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Investigation of hot carrier effects on RF CMOS integrated circuits.

机译:研究热载流子对RF CMOS集成电路的影响。

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摘要

With the continual down-scaling of the channel length of MOSFETs, CMOS technology is being increasingly used for the implementation of radio frequency (RF) circuits and systems. However, with technological scale down of dimensions, the supply voltage is not reduced in the same proportion as the channel length, leading to the presence of strong electric fields in the device. Carriers which go through these strong fields gain high energy and are called "hot carriers." Hot carriers (HC) damage the gate oxide by generating interface traps and trapped charges in the oxide which lead to degradation of the device's performance.; In this thesis, the effects of HC on the DC and RF performance of submicron NMOSFETs were studied. The main HC effects on the DC performance are an increase of the threshold voltage and a decrease of channel carrier mobility. In the small-signal model, these effects appear as a decrease of the transconductance gm and increase of output conductance gds . The degradation of the device's RF performance such as unity-current gain frequency or maximum oscillation frequency is essentially due to the degradation of device's DC performance.; To explore the HC effects on RF circuits, negative resistance oscillators made with CMOS and subjected to HC stress were investigated. The mechanism of operation of these oscillators was studied and, unlike previous analyses, a clear explanation of how the oscillation amplitude reaches to a stable value is presented. Research shows that as long as biasing current of the oscillator circuit is not affected by hot carries, then the operation of oscillator is unaffected. However, if biasing current changes due to stress, then the oscillation amplitude may change, affecting other performance characteristics of the oscillator.; For the low noise amplifier (LNA) studied, the important effect of hot carriers is a drop of its gain. As a result of the decrease in gain, the noise figure of the LNA increased. It was found that linearity properties of the LNA depend on the operating point of the device and can improve after stress.
机译:随着MOSFET沟道长度的不断缩小,CMOS技术正越来越多地用于实现射频(RF)电路和系统。然而,随着技术尺寸的减小,电源电压不会以与沟道长度相同的比例减小,从而导致器件中存在强电场。穿过这些强场的载波会获得高能量,被称为“热载波”。热载流子(HC)通过在氧化物中产生界面陷阱和陷阱电荷来破坏栅极氧化物,从而导致器件性能下降。本文研究了HC对亚微米NMOSFET的DC和RF性能的影响。 HC对DC性能的主要影响是阈值电压的增加和通道载流子迁移率的降低。在小信号模型中,这些影响表现为跨导gm的减小和输出电导gds的增加。诸如单位电流增益频率或最大振荡频率之类的设备的射频性能的下降,基本上是由于设备的直流性能的下降。为了探索HC对RF电路的影响,研究了由CMOS制成并承受HC应力的负电阻振荡器。对这些振荡器的工作机理进行了研究,与以前的分析不同,本文对振荡幅度如何达到稳定值提供了清晰的解释。研究表明,只要振荡器电路的偏置电流不受热进位的影响,振荡器的工作就不会受到影响。但是,如果偏置电流由于应力而改变,则振荡幅度可能会改变,从而影响振荡器的其他性能。对于所研究的低噪声放大器(LNA),热载流子的重要作用是增益下降。由于增益降低,​​LNA的噪声系数增加。已经发现,LNA的线性特性取决于器件的工作点,并且在应力作用下可以改善。

著录项

  • 作者

    Naseh, Sasan.;

  • 作者单位

    McMaster University (Canada).;

  • 授予单位 McMaster University (Canada).;
  • 学科 Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 2005
  • 页码 132 p.
  • 总页数 132
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;
  • 关键词

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