首页> 外文学位 >Simulation and measurement of nanometer-scale resistivity of copper films for interconnect applications.
【24h】

Simulation and measurement of nanometer-scale resistivity of copper films for interconnect applications.

机译:用于互连应用的铜膜纳米级电阻率的仿真和测量。

获取原文
获取原文并翻译 | 示例

摘要

A highly versatile simulation program is developed and used to examine how the resistivity of thin metal films and lines increases as their dimensions approach and become smaller than the mean fee path of electrons in metals such as copper (size effect). The simulation program: (1) provides a more accurate calculation of surface scattering effects than that obtained from the usual formulation of Fuchs' theory, (2) calculates grain-boundary effects that are consistent with the theory of Mayadas and Shatzkes, (3) includes the effects of surface and grain-boundary scattering either separately or together, and (4) simulates the effect on resistivity if a surface of a film or line has a different value for the scattering parameter. The increase in resistivity with decreasing thickness of thin, evaporated copper films (approximately 10 nm to 150 nm thick) was determined from sheet resistance and film thickness measurements. Good agreement between the experimental results with those of the simulation program was obtained when the measured mean grain sizes were used by the simulation program. The mean of the grain sizes tend to decrease with decreasing film thickness and thereby increase the impact of grain-boundary scattering on the effective resistivity of the film. Estimates of the mean grain size for each film were determined from using, in combination, the electron backscatter diffraction (EBSD) and the X-ray diffraction (XRD) methods. With values for the measured change in sheet resistance with temperature of these films, it is shown that measurements of the electrical film thickness, using Matthiessen's rule, agreed to within 3 nm of the physical measurements (profilometer) of these films. Hence, Matthiessen's rule can continue to be used to measure the thickness of a copper film and, by inference, the cross-sectional area of a copper line for dimensions well below the mean free path of electrons in copper at room temperature (39 nm).
机译:开发了一种用途广泛的仿真程序,用于检查金属薄膜和线的电阻率如何随其尺寸接近并变得小于金属(例如铜)中电子的平均电荷路径(尺寸效应)而增大。模拟程序:(1)提供的表面散射效应的计算比通过Fuchs理论的常规公式获得的更为精确;(2)计算的晶粒边界效应与Mayadas和Shatzkes的理论相符;(3)包括单独或一起的表面和晶界散射的影响,并且(4)如果膜或线的表面的散射参数值不同,则模拟对电阻率的影响。从薄层电阻和膜厚测量值可以确定,随着蒸发的薄铜膜(约10nm至150nm厚)厚度的减小,电阻率的增加。当模拟程序使用测得的平均晶粒尺寸时,实验结果与模拟程序之间获得了很好的一致性。晶粒尺寸的平均值倾向于随着膜厚度的减小而减小,从而增加了晶界散射对膜的有效电阻率的影响。结合使用电子背散射衍射(EBSD)和X射线衍射(XRD)方法,可以确定每个膜的平均晶粒尺寸。利用这些薄膜的薄层电阻随温度的测量变化值,可以看出,按照Matthiessen法则,电薄膜厚度的测量结果与这些薄膜的物理测量值(轮廓仪)相差3 nm。因此,可以继续使用Matthiessen法则来测量铜膜的厚度,并据此推断铜线的横截面积,其尺寸远低于室温(39 nm)下铜中电子的平均自由程。 。

著录项

  • 作者

    Yarimbiyik, Arif Emre.;

  • 作者单位

    The George Washington University.;

  • 授予单位 The George Washington University.;
  • 学科 Engineering Electronics and Electrical.;Engineering Materials Science.;Physics Electricity and Magnetism.
  • 学位 D.Sc.
  • 年度 2007
  • 页码 84 p.
  • 总页数 84
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号