Department of Materials Science and Metallurgical Engineering, Sunchon National University, Suncheon, Jeonnam 540-742, Korea;
Department of Materials Science and Metallurgical Engineering, Sunchon National University, Suncheon, Jeonnam 540-742, Korea;
Department of Materials Science and Metallurgical Engineering, Sunchon National University, Suncheon, Jeonnam 540-742, Korea;
Department of Materials Science and Metallurgical Engineering, Sunchon National University, Suncheon, Jeonnam 540-742, Korea;
Lumimicro Co., Ltd, Suwon, Gyeonggi 443-823, Korea;
Semiconductor Device Laboratory, Samsung Advanced Institute of Technology, Yongin, Gyeonggi 446-712, Korea;
机译:磷酸酸性溶液湿法刻蚀N型GaN时表面形貌的演变
机译:极性 - 倒的横向过度栽培和选择性湿法蚀刻和再生(Piloswer)的GaN
机译:N端GaN(0001)表面上ZnO的极性控制
机译:用不同极性湿法蚀刻表面形态的演变
机译:同步加速器X射线光谱和成像研究了ZnO薄膜和钢表面的表面形态和化学演变。
机译:GaN的极性反转横向过生长和选择性湿法蚀刻和再生长(PILOSWER)
机译:极性 - 倒的横向过度栽培和选择性湿法蚀刻和再生(Piloswer)的GaN
机译:用热湿蚀刻结合显微镜和衍射技术研究GaN的缺陷和表面极性