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Making ferromagnetic semiconductors out of Ⅲ-Ⅴ nitride semiconductors

机译:用Ⅲ-Ⅴ族氮化物半导体制造铁磁半导体

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Transition metal doped Ⅲ-Ⅴ nitrides including Mn- or Cr-doped GaN and InN are grown by molecular beam epitaxy. Structural, electronic and magnetic properties have been investigated. Cr-doped GaN shows room temperature ferromagnetism. Bulk sensitive high-energy x-ray photoemission spectroscopy is performed at SPring-8 to elucidate electronic structure of Cr-doped GaN. It is found that the doped Cr contributes to form gap states, which pin the Fermi level. The gap state is attributed to Ga 4s originated state caused by strong hybridization between Cr 3d and band electrons of host GaN. InN-based system was grown by low temperature molecular beam epitaxy. Highly Mn-doped InN shows spin-glass states. Anti-ferromagnetic interaction between Mn ions in InN was suggested. Contrary to the Mn-doped InN, Cr-doped InN shows ferromagnetic property at room temperature.
机译:通过分子束外延生长过渡金属掺杂的Ⅲ-Ⅴ族氮化物,包括Mn或Cr掺杂的GaN和InN。已经研究了结构,电子和磁性。 Cr掺杂的GaN具有室温铁磁性。在SPring-8上进行体敏感的高能X射线光电子能谱分析,以阐明Cr掺杂GaN的电子结构。发现掺杂的Cr有助于形成形成费米能级的间隙态。间隙状态归因于Cr 3d与主体GaN的带电子之间的强杂化而引起的Ga 4s起源状态。 InN基系统是通过低温分子束外延生长的。高度掺杂Mn的InN呈现自旋玻璃态。提出了InN中Mn离子之间的反铁磁相互作用。与Mn掺杂的InN相反,Cr掺杂的InN在室温下显示出铁磁性质。

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