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Making ferromagnetic semiconductors out of III-V nitride semiconductors

机译:制作III-V氮化物半导体的铁磁半导体

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Transition metal doped III-V nitrides including Mn- or Cr-doped GaN and InN are grown by molecular beam epitaxy (MBE). Structural, electronic and magnetic properties have been investigated. Cr-doped GaN shows room temperature ferromagnetism. Bulk sensitive high-energy x-ray photoemission spectroscopy is performed at SPring-8 to elucidate electronic structure of Cr-doped GaN. It is found that the doped Cr contributes to form gap states, which pin the Fermi level. The gap state is attributed to Ga 4s originated state caused by strong hybridization between Cr 3d and band electrons of host GaN. InN-based system were grown by low temperature MBE. Highly Mn-doped InN shows spin-glass states. Anti-ferromagnetic interaction between Mn ions in InN was suggested. Contrary to the Mn-doped InN, Cr-doped InN shows ferromagnetic property at room temperature.
机译:过渡金属掺杂III-V族氮化物,包括Mn-或Cr掺杂的GaN和Inn的分子束外延(MBE)生长。已经研究了结构,电子和磁性。 CR掺杂的GaN显示室温铁磁性。在弹簧-8进行批量敏感的高能X射线照相光谱,以阐明Cr掺杂GaN的电子结构。结果发现掺杂的CR有助于形成间隙状态,该差距为FERMI水平。间隙状态归因于由Host GaN的CR 3D和带电子之间的强烈杂交引起的GA 4S发起状态。基于INN的系统由低温MBE生长。高度Mn-Doped Inn显示旋转玻璃状态。建议宾馆Mn离子之间的抗铁磁相互作用。与Mn-Doped Inn相反,Cr-Doped Inn显示室温下的铁磁性。

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