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Characterization of 6H-SiC Single Crystals Grown by PVT Method Using Different Source Materials and Open or Closed Seed Backside

机译:PVT法生长的6H-SiC单晶在不同源材料和开放或封闭种子背面的情况下的表征

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n- and p-type 6H-SiC single crystals grown by PVT method using different charge materials - poly-SiC sinter or fresh SiC powder - have been studied. An open or closed seed backside during the growth processes have been applied. In the former, a distinct decrease backside etching of the seed was observed. Crystals have been extensively characterized with respect to their purity, quality and electrical properties using complex experimental methods. For the n-type boule an axially and radially homogeneous resistivity ~0.11 Ωcm at 300 K was observed. Electrical properties of the p-type crystal, i.e., high room-temperature resistivity of 239 Ωcm, were affected by compensation effects between residual donors (nitrogen and oxygen) and acceptors (mainly boron).
机译:研究了通过PVT方法使用不同的电荷材料-聚SiC烧结或新鲜的SiC粉-生长的n型和p型6H-SiC单晶。在生长过程中使用开放或封闭的种子背面。在前者中,观察到种子的背面蚀刻明显减少。使用复杂的实验方法已对晶体的纯度,质量和电性能进行了广泛表征。对于n型晶棒,在300 K时观察到的轴向和径向均匀电阻率约为0.11Ωcm。 p型晶体的电性能,即239Ωcm的高室温电阻率,受残余施主(氮和氧)和受主(主要是硼)之间的补偿作用的影响。

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