Univ. Grenoble Alpes, F-38000 Grenoble, France CEA-LETI, MINATEC Campus, F-38054 Grenoble, France,Univ.Grenoble Alpes, LTM, F-38000 France CNRS, LTM, F-38000 Grenoble, France;
Univ. Grenoble Alpes, F-38000 Grenoble, France CEA-LETI, MINATEC Campus, F-38054 Grenoble, France;
Univ. Grenoble Alpes, F-38000 Grenoble, France CEA-LETI, MINATEC Campus, F-38054 Grenoble, France;
Univ.Grenoble Alpes, LTM, F-38000 France CNRS, LTM, F-38000 Grenoble, France;
Univ.Grenoble Alpes, LTM, F-38000 France CNRS, LTM, F-38000 Grenoble, France;
Univ.Grenoble Alpes, LTM, F-38000 France CNRS, LTM, F-38000 Grenoble, France;
Univ.Grenoble Alpes, LTM, F-38000 France CNRS, LTM, F-38000 Grenoble, France;
Univ. Grenoble Alpes, F-38000 Grenoble, France CEA-LETI, MINATEC Campus, F-38054 Grenoble, France;
Univ. Grenoble Alpes, F-38000 Grenoble, France CEA-LETI, MINATEC Campus, F-38054 Grenoble, France;
Univ.Grenoble Alpes, LTM, F-38000 France CNRS, LTM, F-38000 Grenoble, France;
Univ. Grenoble Alpes, F-38000 Grenoble, France CEA-LETI, MINATEC Campus, F-38054 Grenoble, France;
Univ. Grenoble Alpes, F-38000 Grenoble, France CEA-LETI, MINATEC Campus, F-38054 Grenoble, France;
Univ. Grenoble Alpes, F-38000 Grenoble, France CEA-LETI, MINATEC Campus, F-38054 Grenoble, France;
Univ. Grenoble Alpes, F-38000 Grenoble, France CEA-LETI, MINATEC Campus, F-38054 Grenoble, France;
Univ. Grenoble Alpes, F-38000 Grenoble, France CEA-LETI, MINATEC Campus, F-38054 Grenoble, France;
机译:利用原位分子束外延Al_2O_3 / HfO_2和HfAIO / HfO_2钝化InGaAs
机译:电子回旋共振等离子体溅射SiO_2对InGaAs表面氮化对InGaAs金属氧化物半导体电容器界面性能的影响
机译:带有INP屏障层和AL_2O_3 / HFO_2 / AL_2O_3栅极电介质的焊接INGAAS通道MOSFET的界面和电性能
机译:HFO_2 / AL_2O_3 / INGAAS MOSCAP结构和INGAAS等离子氮化在300mm试点线中阐述
机译:使用门控霍尔法提取InGaAs金属氧化物半导体结构中的载流子迁移率和界面陷阱密度。
机译:变质InAs / InGaAs和InAs / GaAs量子点结构的光电性能比较研究
机译:在Gaas衬底上通过金属有机化学气相沉积生长的InGaas / InGaasp / InGap量子阱激光二极管的界面结构
机译:利用碳和锌基层掺杂剂的mOCVD材料生长和优化Inp / InGaas和Inalas / InGaas异质结双极晶体管结构