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Hermeticity and Reliability of Al-Al Thermocompression Wafer Bonding

机译:Al-Al热压晶圆键合的气密性和可靠性

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摘要

Hermeticity and reliability of laminates bonded by Al-Al thermocompression bonding applying different bonding parameters have been investigated. Laminates of diameter 150 mm were realized by bonding a wafer containing membrane structures to wafers with patterned bonding frames. The laminates were bonded applying a bond force of 36 or 60 kN at temperatures ranging from 300 to 400 ℃ for 15, 30 or 60 minutes. The hermetic properties were estimated by optical measurement of membrane deflection after bonding. Reliability was tested by exposing the laminates to a steady-state life test, a thermal shock test, and a moisture resistance test. Laminates bonded applying a bond force of 60 kN at temperatures of 350 ℃ or higher resulted in hermetic and reliable bonds. All the dies on the laminates survived steady-state life test and thermal shock test. Leakage was observed in some dies after exposure to moisture resistance test. Measurements of membrane deflection estimated a maximum leak rate below 10~(-11) mbar-l-s~(-1) for all tested bonding parameters.
机译:研究了采用不同结合参数的Al-Al热压结合层合板的气密性和可靠性。通过将包含膜结构的晶片粘结到具有图案化的粘结框架的晶片上来实现直径为150 mm的层压板。在300到400℃的温度下施加36或60 kN的粘结力将层压板粘结15,30或60分钟。通过光学测量粘合后膜的挠曲性来估计气密性。通过使层压板经受稳态寿命测试,热冲击测试和耐湿性测试来测试可靠性。在350℃或更高的温度下以60 kN的粘结力粘结的层压板可实现密封可靠的粘结。层压板上的所有模具均通过了稳态寿命测试和热冲击测试。暴露于耐湿性测试后,某些裸片中发现泄漏。对于所有测试的粘结参数,膜挠度的测量估计最大泄漏率低于10〜(-11)mbar-l〜(-1)。

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    Centre for materials science and nanotechnology, University of Oslo, Oslo, Norway,SINTEF ICT, Dept. of Microsystems and Nanotechnology, P.O. Box 124 Blindem, N-0314 Oslo, Norway;

    SINTEF ICT, Dept. of Microsystems and Nanotechnology, P.O. Box 124 Blindem, N-0314 Oslo, Norway;

    SINTEF ICT, Dept. of Microsystems and Nanotechnology, P.O. Box 124 Blindem, N-0314 Oslo, Norway;

    SINTEF ICT, Dept. of Instrumentation, P.O. Box 124 Blindern, N-0314 Oslo, Norway;

    Centre for materials science and nanotechnology, University of Oslo, Oslo, Norway;

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