首页> 外文会议>International Semiconductor Device Research Symposium;ISDRS '09 >Electrical characterization of Cr / p-ZnO Schottky contacts grown by pulsed laser deposition (PLD) on Si substrate
【24h】

Electrical characterization of Cr / p-ZnO Schottky contacts grown by pulsed laser deposition (PLD) on Si substrate

机译:硅衬底上通过脉冲激光沉积(PLD)生长的Cr / p-ZnO肖特基接触的电学表征

获取原文
获取外文期刊封面目录资料

摘要

ZnO is an attractive wide band gap semiconductor and a promising material for transparent electronic applications such as short-wavelength LEDs [1,2], lasers [1] and UV detectors [3] because it can be obtained chemically stable and easily deposited on different semiconductor substrates (Si, InGaAs, GaAs) [4]. The use of ZnO in variety of applications is mainly due to its important properties of a direct band gap with an energy gap of 3.37 eV at RT and a large exciton binding energy of 60 meV.
机译:ZnO是一种有吸引力的宽带隙半导体,并且是透明电子应用(如短波长LED [1,2],激光器[1]和UV检测器[3])的有前途的材料,因为它可以化学稳定且易于沉积在不同的表面上。半导体衬底(Si,InGaAs,GaAs)[4]。 ZnO在各种应用中的使用主要是由于其重要的特性:直接带隙,RT处的能隙为3.37 eV,大激子结合能为60 meV。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号