STUDY ON THE POSSIBILITIES OF MODELLING THE PHYSICAL PROCESSES INVOLVED IN SPRAY CVD

摘要

Spray CVD is an attractive CVD technique where thin films can be obtained in a cheap simple way. However, a huge number of deposition parameters are involved, such as: geometrical deposition apparatus parameters, carrier gas flow, substrate temperature, size and distribution droplets, spray angle etc. So, substrate uniform coating requires a detailed knowledge of the spray CVD flow that includes both gas and liquid transfer coupled with heat transfer. This work focuses on the numerical simulation ability to describe these physical processes.