IN SITU INFRARED SPECTROSCOPIC STUDY ON A MANGANESE PRECURSOR IN METALORGANIC CHEMICAL VAPOR DEPOSITION

摘要

The behavior of a manganese precursor, tris(dipivaloylmethanato)manganese (Mn(DPM)_3), for metalorganic chemical vapor deposition (MOCVD) of manganese-containing oxides such as (La,Sr)MnO_3 and (Pr,Ca)MnO_3 with colossal magnetoresistance (CMR) properties were studied by in situ infrared absorption spectroscopy. From the temperature dependence of the infrared absorbance, we investigated the thermal stability of Mn(DPM)_3 in the gas phase. The spectroscopic data on the thermal decomposition of Mn(DPM)_3 were correlated with the characteristics of the deposited oxide films.