Processing Challenges in the Fabrication of Advanced MEMS

摘要

As higher performance and complexity is demanded from advanced MEMS, the processes required to fabricate them are becoming much more demanding. Sub-micron features, rarely found in early MEMS, are now needed for unproved performance. Advanced processes, relying on tools that are available for high-performance ICs, can be used to achieve the desired functionality of advanced MEMS. This paper focuses mainly on devices in the optical domain, but the techniques to fabricate them are common to all MEMS.