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Evaluation of erbium doped III-nitride semiconductors for optoelectronic applications

机译:光电应用中掺do的III族氮化物半导体的评估

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摘要

Erbium doped semiconductors have been intensively studied in the last decade for potential optoelectronic applications. Er~(3+)ions are well known to exhibit sharp and temperature stable luminescence at 1.54 #mu#m, which arises from the intra-4f shell transition ~4I_(13/2)->~4I_(15/2). Therefore, Er doped semiconductors offer the prospect of electrically pumped, compact, and temperature stable 1.54 #mu#m light sources, which could be of great interest for optical fiber communications. Unfortunately, the development of these devices has been hampered by a weak Er~(3+) luminescence efficiency at room temperature. For example, the luminescence from Er doped Si or GaAs quenches by several orders of magnitude when increasing the temperature from 15 to 300K. The recent discovery that Er~(3+) luminescence quenching decreases with increasing band gap of the semiconductor host has stimulated interst in Er doped wide gap semiconductors. In this paper we present an overview of the optical properties of Er doped III-Nitrides and discuss their potential for device applications.
机译:在过去的十年中,对于潜在的光电应用,已经对掺do半导体进行了深入研究。众所周知,Er〜(3+)离子在1.54#mu#m处显示出清晰且温度稳定的发光,这是由于4f内壳层转变〜4I_(13/2)->〜4I_(15/2)引起的。因此,掺Er半导体提供了电泵浦,紧凑且温度稳定的1.54#μm光源的前景,这对于光纤通信可能是非常重要的。不幸的是,在室温下弱的Er〜(3+)发光效率阻碍了这些器件的开发。例如,当温度从15K升高到300K时,掺Er的Si或GaAs的发光会猝灭几个数量级。最近的发现,Er〜(3+)的发光猝灭随着半导体主体带隙的增加而降低,从而刺激了掺Er的宽间隙半导体中的相互作用。在本文中,我们概述了掺Er的III氮化物的光学性质,并讨论了其在器件应用中的潜力。

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