首页> 外文会议>Photonics Technology into the 21st Century: Semiconductors, Microstructures, and Nanostructures >Influence of (001) vicinal GaAs substrates on the optical properties of defects in low-temperature-grown GaAs/AlGaAs multiple quantum wells
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Influence of (001) vicinal GaAs substrates on the optical properties of defects in low-temperature-grown GaAs/AlGaAs multiple quantum wells

机译:(001)邻近GaAs衬底对低温生长的GaAs / AlGaAs多量子阱中缺陷的光学性质的影响

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Abstract: Photoluminescence (PL) spectroscopy and carrier lifetime measurement has been used to characterize optical properties of defects in the low-temperature (LT) grown GaAs/AlGaAs multiple quantum well structures. Two sets of samples were grown at 400 degrees C by molecular beam epitaxy on nominal and miscut towards GaAs substrates, respectively. After growth, samples were subjected to 30 s rapid thermal annealing at 600-800 degrees C. It is found that after annealing, two defect-related PL features appear in the samples grown on miscut GaAs substrates, but not in those grown on nominal GaAs substrates. The carrier lifetimes are about 31 and 5 ps in as-grown on nominal and miscut GaAs substrates, respectively. Optical transient current spectroscopy show different types of deep levels and their dependence on the annealing temperature. We found larger excitonic electroabsorption and stronger photorefractive effect in samples grown on miscut substrates. !13
机译:摘要:已经使用光致发光(PL)光谱和载流子寿命测量来表征低温(LT)生长的GaAs / AlGaAs多量子阱结构中缺陷的光学性质。两组样品通过分子束外延分别在标称和偏切GaAs衬底上于400摄氏度生长。生长后,样品在600-800摄氏度下进行30 s快速热退火。发现退火后,在错误切割的GaAs衬底上生长的样品中出现了两个与缺陷相关的PL特征,而在标称GaAs上生长的样品中则没有。基材。在标称GaAs和误切GaAs衬底上生长的载流子寿命分别约为31 ps和5 ps。光学瞬态电流光谱显示出不同类型的深能级及其对退火温度的依赖性。我们发现在错误切割的基板上生长的样品中,较大的激子电吸收和较强的光折变效应。 !13

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