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Theoretical revision of quantum efficiency formula for thin AlGaAs/GaAs photocathodes

机译:AlGaAs / GaAs薄阴极的量子效率公式的理论修正

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There exist limitations of conventional quantum efficiency models for both reflection-mode (r-mode) and transmission-mode (t-mode) exponential-doped GaAs photocathodes in some cases. The revised quantum efficiency models of the r-mode and t-mode photocathodes are solved from the one-dimensional continuity equations, wherein the built-in electric field in the GaAs layer and the electrons generated from the AlGaAs layer are considered. According to the revised models, the effects of some relational performance parameters are analyzed, such as the thicknesses of GaAs layer and AlGaAs layer, and the interface recombination velocity on the quantum efficiency for t-mode and r-mode photocathodes in combination with the conventional models. The results show that the main contribution of photoelectrons generated from AlGaAs layer to quantum efficiency in the shortwave (i.e. high incident photon energy) region, depends on the factors including cathode thickness and interface recombination velocity.
机译:在某些情况下,传统的量子效率模型对于反射模式(r模式)和透射模式(t模式)指数掺杂的GaAs光电阴极都存在局限性。从一维连续方程求解了修正的r型和t型光电阴极的量子效率模型,其中考虑了GaAs层中的内置电场和AlGaAs层产生的电子。根据修正后的模型,结合常规方法,分析了GaAs层和AlGaAs层的厚度,界面复合速度对t型和r型光电阴极量子效率等相关性能参数的影响。楷模。结果表明,由AlGaAs层产生的光电子对短波(即高入射光子能量)区域中的量子效率的主要贡献取决于包括阴极厚度和界面复合速度的因素。

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