IMEC'S RESEARCH PROGRAM AND THE ITRS CHALLENGES

摘要

IMEC is one of Europe's largest independent research centers on microelectronics. Research is performed on the development of process steps and modules for sub 0.13μm CMOS technologies. 193nm lithography is studied for the 100nm device generation and a 157nm lithography program is set up for the 70nm node. The Rotagoni~(TM) drying technique is one of the major breakthroughs in single-wafer cleaning. The search for a new gate dielectric focuses on A1_2O_3, HfO_2, ZrO_2 and various mixtures. The program on low-k dielectrics aims at low effective k values after full processing and more recently IMEC launched a program on the wafer-level packaging. The l00nm CMOS integration program was set up to integrate these process steps and modules. Finally, this paper mentions results of IMEC's research on ferroelectric memories, BICMOS and nanotechnology.