IMEC Programs Prepare for Next-Generation CMOS

摘要

IMEC (Leuven, Belgium) has set up industrial affiliation programs in which mixed research teams are addressing challenges that must be overcome for introduction of 0.13 μm technology. They include use of 193 nm optical lithography, copper metaliza-tion and low-k dielectrics as inter-metal materials. Fabrication of devices with features half the size of the laser wavelength will require better phase shift masks and optical proximity correction.