首页> 外文会议>Microscopy of semiconducting materials 1999 >Mircrostructural investigation of oxidized Ni/Au ohmic contact to p-type GaN
【24h】

Mircrostructural investigation of oxidized Ni/Au ohmic contact to p-type GaN

机译:Ni / Au欧姆接触p型GaN的微观结构研究

获取原文
获取原文并翻译 | 示例

摘要

The phase evolution of oxidized (10nm)Ni/(5nm)Au films on p-GaN was examined with a field emission gun transmission electron microscope in conjunction with composition analyses to explore the mechanism of formation of low resistance ohmic contact to p-GaN.The p-GaN/Ni/Au sample heat treated above 500 deg C in air was mainly composed of a mixture of crystalline NiO,Au and amorphous Ni-Ga-O phases.Small voids adjacent to the p-GaN film were also found.moreover,Nio partially contacts to p-GaN as well as Au islands and the amorphous Ni-Ga-O phases.The results suggest that the crystalline NiO and/or amorphous Ni-Ga-O phases may play a significant role in the formation of a low resistance ohmic contact to p-GaN.
机译:用场发射枪透射电子显微镜结合成分分析检查了p-GaN上氧化的(10nm)Ni /(5nm)Au膜的相演化,并探讨了与p-GaN形成低电阻欧姆接触的机理。在空气中500摄氏度以上进行热处理的p-GaN / Ni / Au样品主要由结晶NiO,Au和非晶态Ni-Ga-O相的混合物组成,并且还发现了与p-GaN膜相邻的小空隙。此外,Nio部分与p-GaN以及Au岛和非晶Ni-Ga-O相接触。结果表明,结晶NiO和/或非晶Ni-Ga-O相可能在形成Pb的过程中起重要作用。与p-GaN的低电阻欧姆接触。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号