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Production and Characterization of Bi_2O_3-WO_3-TeO_2 thin films with Au nanoparticles for applications with micro and nanoelectronic devices

机译:具有纳米金的Bi_2O_3-WO_3-TeO_2薄膜的制备和表征,用于微电子和纳米电子器件

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摘要

In the present work we report the production and characterization of Bi_2O_3-WO_3-TeO_2 (BWT) thin films with Au nanoparticles. RF co-sputttering technique was used for the deposition of the amorphous films on substrates. A target of BWT was RF-sputtered simultaneously with pure Au target using argon plasma; O_2 flow was also used in order to replenish oxygen of BWT lost in process. Nucleation was obtained by means of heat treatment and also using heat treatment together with ultraviolet irradiation. Elipsometry, perfilometry, X-ray fluorescence, transmission electron microscopy, atomic force and optical absorption technique were used to evaluate the applications for micro and nanoelectronic devices.
机译:在本工作中,我们报告了具有Au纳米粒子的Bi_2O_3-WO_3-TeO_2(BWT)薄膜的生产和表征。 RF共溅射技术用于在衬底上沉积非晶膜。使用氩等离子体同时对BWT靶和纯Au靶进行射频溅射;还使用O_2流量以补充过程中损失的BWT的氧气。通过热处理并且还使用热处理与紫外线照射一起获得成核。电泳,渗透测定,X射线荧光,透射电子显微镜,原子力和光吸收技术被用来评估微和纳米电子设备的应用。

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  • 来源
  • 会议地点 Joao Pessoa(BR);Joao Pessoa(BR)
  • 作者单位

    Departamento de Engenharia de Sistemas Eletronicos, Escola Politecnica da USP, Sao Paulo, SP, Brazil;

    Laboratorio de Tecnologia em Materials Fotonicos e Optoeletronicos, Faculdade de Tecnologia de Sao Paulo, Sao Paulo, SP, Brazil;

    Departamento de Engenharia de Sistemas Eletronicos, Escola Politecnica da USP, Sao Paulo, SP, Brazil;

    Instituto de Pesquisas Energeticas e Nucleares, Institute de Fisica da USP, Sao Paulo, SP, Brazil;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 半导体技术;
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