首页> 外文会议>Symposium on Microelectronics Technology and Devices >Production and Characterization of Bi_2O_3-WO_3-TeO_2 thin films with Au nanoparticles for applications with micro and nanoelectronic devices
【24h】

Production and Characterization of Bi_2O_3-WO_3-TeO_2 thin films with Au nanoparticles for applications with micro and nanoelectronic devices

机译:用Au纳米粒子的Bi_2O_3-WO_3-TEO_2薄膜的生产和表征用于微型和纳米电子器件的应用

获取原文

摘要

In the present work we report the production and characterization of Bi_2O_3-WO_3-TeO_2 (BWT) thin films with Au nanoparticles. RF co-sputttering technique was used for the deposition of the amorphous films on substrates. A target of BWT was RF-sputtered simultaneously with pure Au target using argon plasma; O_2 flow was also used in order to replenish oxygen of BWT lost in process. Nucleation was obtained by means of heat treatment and also using heat treatment together with ultraviolet irradiation. Elipsometry, perfilometry, X-ray fluorescence, transmission electron microscopy, atomic force and optical absorption technique were used to evaluate the applications for micro and nanoelectronic devices.
机译:在本工作中,我们向Au纳米颗粒报告Bi_2O_3-WO_3-TEO_2(BWT)薄膜的生产和表征。 RF Co-Sputttering技术用于底物上的非晶膜沉积。使用氩气等离子体与纯Au靶同时rf-溅射的靶标; O_2流量也用于补充加工过程中BWT的氧气。通过热处理获得成核,也使用热处理与紫外线照射一起获得。 Helipsometry,PerfileRyry,X射线荧光,透射电子显微镜,原子力和光学吸收技术用于评估微型和纳米电子器件的应用。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号