Prototyping 9-inch size PSM Mask Blanks for 450mm wafer process (2016)

摘要

6-inch size (known as 6025QZ) binary Cr mask is widely used in the semiconductor lithography for over 20years. Recently for the 450mm wafer process, high grade 9-inch size mask is expected. For this application, we have studied and developed prototyping 9-inch size PSM KrF and ArF mask blanks. This time we will explain these PSM mask blanks status.