Semiconductor nanowire (NW)-based optoelectronic devices can exhibit superior performances in comparison to their thin film counterparts, as a result of their improved electrical and optical properties. For example, the light-matter interaction in nanowires is enhanced due to the high surface-volume ratio and the light confinement effect resulting from the resonant cavity formed by the nanowire. The enhanced light absorption when using a nanowire geometry can be exploited to increase the responsivity of nanowire-based photodetectors. Light detection and emission at near-IR wavelengths (NIR, 0.8-1.5 μm) can be tailored via strain engineering using Ge-based NW devices. Furthermore, by incorporating Sn in the Ge lattice a direct band gap can be achieved across the short-wave-IR (SWIR, 1.5-3.0 μm) and mid-IR (MIR, 3-8 μm) wavelength range. Despite the equilibrium solubility of Sn in Ge being limited to ～1at.%, non-equilibrium growth methods recently developed in a chemical vapor deposition (CVD) reactor demonstrated a Sn content of 18 at.% with a room-temperature photoluminescence emission up to 4.0 μm. Similarly, when moving to the nanoscale a Sn incorporation well above 10 at.% with a direct band gap emission was demonstrated using Ge/GeSn core/shell NWs.
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