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Tunnel magnetoresistance in ultrathin MnGa-based perpendicular magnetic tunnel junctions utilizing bcc-Co based interlayers

机译:利用BCC-Co中间层隧道基于超薄的垂直磁隧道结的隧道磁阻

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Tetragonal Mn-based perpendicular magnetic tunnel junctions (p-MTJs) attracts attention for magnetic random access memory and advanced THz devices1. Past studies of Mn-based p-MTJs have been reported small TMR ratio at room temperature below 32%without magnetic interlayer2, and maximum of 60%even if FeCo interlayers were used3. Thus, it is crucial to find new interlayer materials to further enhance the TMR ratio for realizing Mn-based p-MTJs for practical applications. In this study, we focused on bcc-CoMn binary alloy possessing highly spin-polarized Δ1 band4 as new interlayer material for ultrathin MnGa-based p-MTJs5, and investigated its TMR properties6. The stacking structure of the p-MTJs are MgO(001) substrate/Cr(40)/Co_(55)Ga_(45)(30)/ Mn_(61)Ga_(39)(3)/ CoxMn_(100-x)(0.8) /Mg(0.4)/MgO(2)/ Fe_(60)Co_(20)B_(20) (1.2)/Ta(3)/Ru(5) (thickness is in nanometers). After microfabrication using conventional photolithography and Ar ion milling process, the MTJs were annealed at 250°Cin a vacuum furnace. TMR measurements were performed by a PPMS. Figure 1 shows the TMR curves of the MTJs with Co_(80)Mn_(20) interlayer measured at 300 and 10K. The Co_(80)Mn_(20) interlayer shows the TMR ratio up of approximately 85%(209%) at 300 and 10 K. respectively. Meanwhile, the shape of the TMR curve and the significant increase of coercivity indicate that Co_(80)Mn_(20) interlayer strongly and antiferromagnetically couples with perpendicularly-magnetized MnGa layer. The TMR ratio of 209%is larger than the value expected from Julliere’s relation with spin-polarization of fcc-Co and CoFe(B). Thus, this high TMR ratio would originate from coherent tunneling between highly spin-polarized ⊿ 1 bands in bcc-Co (Co-Mn) and CoFe(B) electrodes, even though the Co-Mn interlayer thickness is very small, 0.8 nm.
机译:基于四方MN的垂直磁隧道结(P-MTJS)吸引了磁随机存取存储器和高级THz器件1的关注。在没有磁性中间层2的情况下,在室温下报告了基于Mn的P-MTJ的研究小的TMR比率,即使使用FECO中间层3,也最大为60%。因此,找到新的中间层以进一步增强用于实现基于MN的P-MTJ的TMR比对于实际应用是至关重要的。在该研究中,我们专注于具有高旋转偏振Δ1带4的BCC-COMN二元合金,作为基于超薄的超薄的P-MTJS5的新中间材料,并研究其TMR性能6。 P-MTJ的堆叠结构是MgO(001)衬底/ Cr(40)/ CA_(55)GA_(45)/ MN_(61)GA_(39)/ COXMN_(100-x) (0.8)/mg(0.4)/ mm(2)/ fe_(60)co_(20)b_(20)/ ta(3)/ ru(5)(厚度为纳米)。在使用常规光刻和Ar离子铣削过程中进行微制造后,MTJ在250℃下的真空炉退火。 TMR测量由PPMS进行。图1示出了在300和10K测量的CO_(80)MN_(20)中间层的MTJS的TMR曲线。 CO_(80)MN_(20)中间层分别显示TMR比例为约85%(209%),分别为300和10K。同时,TMR曲线的形状和矫顽力的显着增加表明CO_(80)MN_(20)中间层强直地和反式磁化的磁化的MNGA层。 TMR比例为209%,大于Julliere与FCC-Co和Cofe(B)的旋转极化的关系的值。因此,即使CO-MN中间层厚度非常小,0.8nm,这种高TMR比率也将来自BCC-CO(CO-MN)和COFE电极的高度旋转极化⊿1条带之间的相干隧道源自在高旋转偏振的⊿1带之间。

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