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Croconic Acid Thin Film Formation for Ferroelectric Gate OFETs

机译:铁电闸门的鳄梨薄膜形成

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Pentacene-based ferroelectric gate transistors with croconic acid (CrA) thin film was fabricated for the first time. The memory window (MW) of 1.9 V was obtained from the capacitance-voltage (C-V) characteristics of Al/CrA(50 nm)/SiO_2/Si(100) metal-ferroelectric-insulator-semiconductor (MFIS) diode, where the deposition temperature of CrA was room temperature (RT). Butterfly type C-V characteristics was observed for Al/CrA(50 nm)/Al/SiO_2/Si(100) metal-ferroelectric-metal (MFM) diode. Furthermore, a pentacene-based p-type organic field-effect transistor (OFET) with CrA gate insulator was fabricated, and clockwise hysteresis loop was observed in I_D-V_G characteristic, which is attributed to the ferroelectric properties of CrA gate insulator.
机译:基于五烯的铁电栅极晶体管,首次制造具有冰淇淋(CRA)薄膜的薄膜。从Al / CRA(50nm)/ SiO_2 / Si(100)金属 - 铁电绝缘体 - 半导体(MFIS)二极管的电容 - 电压(CV)特性获得1.9V的记忆窗口(MW),其中沉积CR的温度为室温(RT)。对于Al / CRA(50nm)/ Al / SiO_2 / Si(100)金属铁电金属(MFM)二极管,观察到蝴蝶型C-V特性。此外,制造具有CRA栅极绝缘体的五烯基的P型有机场效应晶体管(OFET),在I_D-V_G特征中观察到顺时针滞后环,其归因于CRA栅极绝缘体的铁电性能。

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