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Effect of Growth Temperature on Number of Layers and Electrical Properties of Graphene Grown on Copper Film using LPCVD Method

机译:LPCVD法在铜膜上生长石墨烯层数对铜膜数量和电性能的影响

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Graphene is a wonder material of 21st century with two dimensional honeycomb like structure. we propose the synthesis of graphene using Low Pressure Chemical Vapor Deposition with C_2H_2 as the source gas and H_2 as the carrier gas at four different temperatures. The as grown samples have been characterized by FESEM, Raman spectroscopy and DC conductivity. We emphasized the effect of growth temperature on the properties of as-grown graphene and studied that which temperature is suitable to lower the number of layers.
机译:Graphene是21世纪的奇迹材料,具有两维蜂窝状结构。我们提出使用低压化学气相沉积与C_2H_2作为源气体和H_2作为载气,在四种不同温度下使用低压化学气相沉积来合成石墨烯。作为生长样品的特征在于FESEM,拉曼光谱和直流电导率。我们强调了生长温度对油花石墨烯的性质的影响,并研究了哪种温度适合降低层数。

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