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Voltage Switching Limits of Lateral GaN Power Devices

机译:横向GaN电源装置的电压切换限制

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The dv/dt switching limitations of power semiconductor devices are evaluated in a boost (PFC) power converter using circuit simulations. State-of-the-art commercial silicon CoolMOS devices, commercial Silicon Carbide (SiC) Junction Barrier Schottky (JBS) diodes, and emerging Gallium Nitride (GaN) lateral power transistors are considered. It is shown that although SiC and GaN power devices have low stored charge and small capacitances, they experience high switching dv/dt stresses which may pose serious switching limitations especially in high-frequency power converters. This problem is likely to be further exacerbated by the presence of a high density of crystal defects in SiC and GaN materials which will manifest in the form of poor field-reliability. Specific guidelines for device selection are recommended in order to optimize both performance and field-reliability.
机译:使用电路模拟在升压(PFC)功率转换器中评估功率半导体器件的DV / DT切换限制。考虑了最先进的商用硅酷热摩擦装置,商用碳化硅(SiC)结肖特基(JBS)二极管以及出现的氮化镓(GaN)横向功率晶体管。结果表明,虽然SiC和GaN功率装置具有低存储的电荷和小电容,但它们经历了高开关DV / DT应力,其可能构成严重的切换限制,尤其是在高频功率转换器中。该问题可能通过在SiC和GaN材料中存在高密度的晶体缺陷而进一步加剧,这将以差的现场可靠性的形式表现出来。建议使用特定的设备选择指南,以优化性能和现场可靠性。

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