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Voltage Switching Limits of Lateral GaN Power Devices

机译:横向GaN功率器件的电压开关极限

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The dv/dt switching limitations of power semiconductor devices are evaluated in a boost (PFC) power converter using circuit simulations. State-of-the-art commercial silicon CoolMOS devices, commercial Silicon Carbide (SiC) Junction Barrier Schottky (JBS) diodes, and emerging Gallium Nitride (GaN) lateral power transistors are considered. It is shown that although SiC and GaN power devices have low stored charge and small capacitances, they experience high switching dv/dt stresses which may pose serious switching limitations especially in high-frequency power converters. This problem is likely to be further exacerbated by the presence of a high density of crystal defects in SiC and GaN materials which will manifest in the form of poor field-reliability. Specific guidelines for device selection are recommended in order to optimize both performance and field-reliability.
机译:使用电路仿真在升压(PFC)功率转换器中评估功率半导体器件的dv / dt开关限制。考虑了最先进的商用硅CoolMOS器件,商用碳化硅(SiC)结势垒肖特基(JBS)二极管和新兴的氮化镓(GaN)横向功率晶体管。结果表明,尽管SiC和GaN功率器件具有较低的存储电荷和较小的电容,但它们会承受较高的开关dv / dt应力,这可能会带来严重的开关限制,尤其是在高频功率转换器中。 SiC和GaN材料中高密度的晶体缺陷的存在可能会进一步加剧该问题,这种缺陷将以不良的场可靠性形式出现。为了优化性能和现场可靠性,建议使用特定的设备选择指南。

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