首页> 外文会议>Global Conference on Power Control and Optimization >CONTROL OF THE ELECTRORESISTANCE EFFECT OBTAINED IN Pr0.5Ca0.5MnO3 MAGNETIC OXIDE THIN FILM BY ELECTROSTATIC FIELD IN A FERROELECTRIC/MANGANITE OPTIMIZED DEVICE
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CONTROL OF THE ELECTRORESISTANCE EFFECT OBTAINED IN Pr0.5Ca0.5MnO3 MAGNETIC OXIDE THIN FILM BY ELECTROSTATIC FIELD IN A FERROELECTRIC/MANGANITE OPTIMIZED DEVICE

机译:通过静电/锰岩优化装置中的静电场控制在Pr0.5ca0.5mNO3磁氧化物薄膜中获得的电磁效应

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The aim of this study is to probe the effect of an electric field on charge ordered (CO) magnetic compounds. Thus, we have fabricated a three-terminal device analogous to a field-effect transistor (FET), using the Pr_(0.5)Ca_(0.5)MnO_3 (PCMO) charge-ordered manganite as the channel material and ferroelectric PbZr_xTi_(1-x)O_3 (PZT) as the gate insulator. The optimized technological process is based on five UV lithography levels. In such ferroelectric FET under gate polarization, and with PCMO channel in which coexist magnetic metallic regions and an insulating matrix, an ER effect of 39%, that is associated to a modulation of the manganite channel conductivity, under the electrostatic field, was measured under V_G = ± 6 V, for temperatures lower than the charge ordered temperature (T<220K). The accumulation (or the depletion) of the carriers controlled by the electrostatic field and the percolation of the grown metallic phases in the insulator matrix will be discussed for interpreting the changes of the manganite resistance.
机译:本研究的目的是探测电场对电荷有序(CO)磁性化合物的影响。因此,我们已经使用PR_(0.5)CA_(0.5)MnO_3(PCMO)电荷有序的锰铁作为通道材料和铁电PBZR_XTI_(1-X.)制造了一个三端装置。 )O_3(PZT)作为栅极绝缘体。优化的技术过程基于五种UV光刻水平。在栅极偏振下的这种铁电FET中,并且在其中共存磁性金属区域和绝缘基质的PCMO通道,测量静电场下与锰岩通道电导率的调节相关的39%的ER效应V_G =±6 V,温度低于电荷有序温度(T 220K)。将讨论由静电场控制的载体的积累(或耗尽)和绝缘体基质中生长的金属相的渗透以解释锰矿抗性的变化。

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