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Characterization of intermetallic compounds in Cu-Al ball bonds: thermo-mechanical properties, interface delamination and corrosion

机译:Cu-Al球键中金属间化合物的表征:热机械性能,界面分层和腐蚀

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In high power automotive electronics copper wire bonding is regarded as the most promising alternative for gold wire bonding in 1~(st) level interconnects. In the Cu-Al ball bond interface the growth of intermetallic compounds can deteriorate the electrical and mechanical properties of the interconnection. A summary of the thermo-mechanical properties of Cu-Al intermetallic compounds is given. Delamination experiments were performed to study interfacial cracking in the Cu-Al system. Interfacial delamination initiates in the Al-rich intermetallics (CuAl, CuAl_2) and propagates easily into other intermetallic layers. The Cu_9Al_4 - Cu s.s. is also found to be susceptible for delamination fracture. To quantify the corrosion and oxidation sensitivity of Cu-Al intermetallics 8 different aging experiments under various conditions (?t, ?T, air or halogen-rich solution or combined) were performed. In all cases the oxidation/corrosion attack at the non-equilibrium Cu s.s. -interface with the Cu-Al intermetallics is more severe than of a homogeneous bulk solid solution of aluminum in copper (with more than 5 wt% Al). The oxidation/corrosion attack is even more severe than for pure copper.
机译:在高功率汽车电子中,铜线键合被认为是1〜(ST)水平互连中的金线键合最有前途的替代方案。在Cu-Al球键界面中,金属间化合物的生长可以恶化互连的电气和力学性能。给出了Cu-Al金属间化合物的热机械性能的概述。进行分层实验以研究Cu-Al系统中的界面裂缝。界面分层在富含al的金属间金属间(Cual,Cual_2)中发起,并容易地传播到其他金属间层中。 CU_9AL_4 - CU S.S.也发现易受分层骨折的影响。为了量化Cu-Al金属间质的腐蚀和氧化敏感性,在各种条件下进行不同的老化实验(Δt,Δt,空气或卤化溶液或组合)。在所有情况下,在非平衡Cu S.的氧化/腐蚀攻击 - 与Cu-Al金属间化合物的接口比铜中铝的均匀堆积固体溶液更严重(具有超过5wt%的Al)。氧化/腐蚀攻击甚至比纯铜更严重。

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