首页> 外文会议>International Congress on Advances in Applied Physics and Materials Science >A Numerical Investigation of the Strain Effect on Saturation Optical Intensity in Electroabsorption Modulators Based on Asymmetric Intra-step-barrier Coupled Double Strained Quantum Wells
【24h】

A Numerical Investigation of the Strain Effect on Saturation Optical Intensity in Electroabsorption Modulators Based on Asymmetric Intra-step-barrier Coupled Double Strained Quantum Wells

机译:基于不对称的阶段屏障耦合双应变量子阱的电吸收调节器饱和光强度对饱和光学强度的应变效应的数值研究

获取原文

摘要

In this paper, the strain effect on saturation optical intensity in electroabsorption modulators (EAMs) based on asymmetric intra-step-barrier coupled double strained quantum well (AICD-SQWs) active region is theoretically investigated and compared with intra-step quantum well (IQW) structure. For this purpose, the thermionic emission and tunneling escape processes are taken into account and the escape times of photogenerated carriers are calculated. Then, the electroabsorption coefficient is calculated for different well strains for TE input light polarization. Finally, the saturation optical intensity of electroabsorption modulators with AICD-SQW structures in comparison with IQW structure is evaluated. Numerical results show that the tensile strain of well has the most significant effect on the saturation optical intensity of electroabsorption modulators with AICD-SQW structures due to reduction in escape times.
机译:在本文中,理论上研究了基于不对称的步骤禁止耦合双应变量子阱(AICD-SQW)有源区的电吸收调节器(EAM)中饱和光学强度的应变效应。与步骤内量子阱(IQW ) 结构体。为此目的,考虑了热离子发射和隧道逸出过程,并计算了光生载体的逃逸时间。然后,针对TE输入光极化的不同井菌株计算电吸收系数。最后,评估了与IQW结构相比,具有AIDD-SQW结构的电吸收调制器的饱和光学强度。数值结果表明,由于逃逸时间的减少,井的厚度对电吸收调制器的饱和光学强度具有最显着的影响。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号