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Ultrafast carrier dynamics and enhanced electroabsorption in (gallium,indium)arsenide/(aluminum,indium)arsenide asymmetric double quantum well structures.

机译:超快载流子动力学和增强的(镓,铟)砷/(铝,铟)砷​​非对称双量子阱结构中的电吸收。

摘要

An experimental study, utilizing a novel nondegenerate transmission pump/probe technique, of ultrafast electron and hole tunneling in (Ga,In)As/Al,In)As asymmetric double quantum wells (ADQWs) is presented. A single time constant is observed at low carrier densities indicating the holes tunnel from the narrow well (NW) to the wide well (WW) at least as fast as electrons. At high carrier densities a two component decay is observed, consistent with phase-space filling and space-charge effects blocking tunneling carriers. The fast transfer of electrons was confirmed to be a LO-phonon assisted process. A detailed theoretical study of ultrafast hole tunneling at low carrier densities indicates that in ternary materials alloy disorder is responsible for fast hole transfer between the wells. Enhanced electroabsorption in selectively doped (Ga,In)As/(Al,In)As ADQWs by the use of real space electron transfer is demonstrated. The electron concentration in both the WW and NW is investigated by field-dependent absorption and photoluminescence spectroscopy. The results are compared to absorption changes in an undoped ADQW structure which utilizes the quantum confined Stark effect. The doped modulator exhibits a significantly larger red-shift with applied field than the undoped structure.
机译:提出了一种利用新颖的非简并传输泵/探针技术对(Ga,In)As / Al,In)As非对称双量子阱(ADQWs)中超快电子和空穴隧穿进行实验研究。在低载流子密度下观察到单一时间常数,这表明空穴从窄阱(NW)到宽阱(WW)的隧穿速度至少与电子一样快。在高载流子密度下,观察到两个成分的衰减,这与相空间填充和空间电荷效应对隧穿载流子的阻挡相一致。电子的快速转移被证实是LO声子辅助的过程。在低载流子密度下进行的超快速空穴隧穿的详细理论研究表明,在三元材料中,合金无序是造成孔之间快速空穴转移的原因。通过使用真实空间电子转移,已证明在选择性掺杂(Ga,In)As /(Al,In)As ADQWs中增强了电吸收。通过场依赖吸收和光致发光光谱法研究了WW和NW中的电子浓度。将结果与未利用量子限制斯塔克效应的未掺杂ADQW结构中的吸收变化进行比较。与未掺杂的结构相比,掺杂的调制器在施加电场时表现​​出明显更大的红移。

著录项

  • 作者

    Krol Mark Francis.;

  • 作者单位
  • 年度 1995
  • 总页数
  • 原文格式 PDF
  • 正文语种 en
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