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Ferroelectric domain patterns writing in PbZr_(0.3)Ti_(0.7)O_3 thin films using a biased sweeping PFM tip

机译:使用偏置扫描PFM尖端的PBZR_(0.3)TI_(0.7)O_3薄膜写入的铁电域图案

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(111) preferred orientated ferroelectric PbZr_(0.3)Ti_(0.7)O_3 (PZT) thin films with grain size of 300-500 nm, and root-mean-square (RMS) roughness of 2.927 nm were prepared by using radio frequency magnetron sputtering process. Piezoresponse force microscopy (PFM) has been used to write complex ferroelectric domain patterns using a biased sweeping PFM tip. Subsequent imaging of switched domain patterns was performed. The stabilization of the written domain was investigated by inverse biased tip scanning. The results indicate that these films are suitable for submicron scale domain writing, and the resulted domain are affected by the condition of crystalline boundary. The written domain is superficial and can be easily erased by inverse tip-applied electric field.
机译:(111)通过使用射频磁控溅射制备具有300-500nm的晶粒尺寸的优选的优选的优选的铁电Pbzr_(0.3)Ti_(0.7)O_3(PZT)薄膜,并通过射频磁控溅射制备2.927nm的根均方(RMS)粗糙度过程。压电响应力显微镜(PFM)已用于使用偏置扫描PFM尖端编写复杂的铁电域图案。执行切换域模式的后续成像。通过反向偏压扫描研究了书面领域的稳定化。结果表明,这些薄膜适用于亚微米级域写,所得结构域受晶边界的状况的影响。书面领域是肤浅的,可以通过逆尖端施加的电场轻松擦除。

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