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Inspection solutions for EUV-mask defectivity applications - (PPT)

机译：EUV-掩模缺陷应用的检查解决方案 - （PPT）

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Patterned mask inspection application by DUV optics: Sub wavelength pattern, near resolution limits; Thick, highly polarizing mask; Very small sub-wavelength defect; Mask inspection solutions on 193nm inspector: Highest resolution; Optimal polarization; Illumination shaping.

机译：Duv光学图案掩模检查应用：子波长图案，近分辨率限制;厚，高偏振面膜;非常小的子波长缺陷; 193NM检查员的面罩检查解决方案：最高分辨率;最佳极化;照明整形。

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《International Symposium on Extreme Ultraviolet Lithography 》|2010年||共6页
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Shmoolik Mangan; Nir Shoshani; Asaf Jaffe; Lior Shoval; Anoop Sreenath;
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中图分类 TN305.7-53;
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Inspection solutions for EUV-mask defectivity applications - (PPT)

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