The SEMATECH Berkeley MET: 2D patterning at 20 nm HP and progress towards 0.5-NA - (PPT)

机译：Sematech Berkeley会议：2D在20nm HP的图案化并进展到0.5-na - （PPT）

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Optical system: Same capabilities as MET I. Facilities: Track; Clean room; Solvent develop; Compatible with a robotic upgrade.

机译：光学系统：相同的能力I.设施：轨道;整理房间;溶剂发展;兼容机器人升级。

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《International Symposium on Extreme Ultraviolet Lithography》|2012年||共23页
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Chris Anderson; Lorie Mae Baclea-an; Mark Binenbaum; Paul Denham; Ken Goldberg; Gideon Jones; Gayan Pothuhera; Jessica Ritland; Jessalyn Sincher; Patrick Naulleau; Yoshi Hishiro; Ken Murayama; Dominic Ashworth; Stefan Wurm;
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中图分类 TN305.7-53;
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1. 22-nm Half-pitch extreme ultraviolet node development at the SEMATECH Berkeley microfield exposure tool [J] . Patrick P. Naulleau, Christopher N. Anderson, Jerrin Chiu, Microelectronic Engineering . 2009,第4a6期

机译：SEMATECH伯克利微场曝光工具开发了22-nm半螺距的极紫外节点
2. 157-nm lithography: Sematech sees progress in lens materils, challenges continue in pellicles [J] . ELECTRONIC CHEMICALS NEWS Group Electronic Chemicals News . 2002,第9期

机译：157 nm光刻：Sematech看到透镜材料方面取得了进步，薄膜组件方面的挑战仍在继续
3. 20 nm polysilicon gate patterning and application in 36 nm complementar metal-oxide-semiconductor devices [J] . Qiuxia Xu, Qian He, Ming Liu, Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structure . 2003,第6期

机译：20 nm多晶硅栅极图案化及其在36 nm互补金属氧化物半导体器件中的应用
4. The SEMATECH Berkeley MET: 2D patterning at 20 nm HP and progress towards 0.5-NA - (PPT) [C] . Chris Anderson, Lorie Mae Baclea-an, Mark Binenbaum, International Symposium on Extreme Ultraviolet Lithography . 2012

机译：Sematech Berkeley会议：2D在20nm HP的图案化并进展到0.5-na - （PPT）
5. Patterns of growth and development of the human skeleton and dentition in relation to environmental quality: A biocultural analysis of a sample of 20th century Portuguese subadult -documented skeletons. [D] . Cardoso, Hugo F. V. 2006

机译：与环境质量相关的人类骨骼和牙列的生长和发育模式：对20世纪葡萄牙亚成年人记录的骨骼样本的生物文化分析。
6. Progress in Proton-detected Solid-state NMR (SSNMR): Super-fast 2D SSNMR Collection for Nano-mole-scale Proteins [O] . Yoshitaka Ishii, Ayesha Wickramasinghe, Isamu Matsuda, -1

机译：质子检测的固态NMR（SSNMR）的进展：纳米级蛋白质的超快二维SSNMR收集
7. The SEMATECH Berkeley MET: demonstration of 15-nm half-pitch in chemically amplified EUV resist and sensitivity of EUV resists at 6.x-nm [O] . Chris Anderson, Dominic Ashworth, Lorie Mae Baclea-An, 2012

机译：Sematech Berkeley会议：在6.x-nm下，在化学扩增的EUV抗蚀剂和EUV抗蚀剂的敏感性中展示了15nm的半场

The SEMATECH Berkeley MET: 2D patterning at 20 nm HP and progress towards 0.5-NA - (PPT)

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